Elionix System
The Electron Beam Lithography System – Elionix ELS-G100 is an advanced electron beam lithography (EBL) system designed for high-resolution nanofabrication and nano patterning. With sub-10 nm resolution, ultra-stable beam positioning, and a high writing speed of 100 MHz, the system enables precise structuring across a wide range of materials, including semiconductors (Si, GaAs, InP), oxides (SiO2, Al2O3), and metallic thin films. Its versatility makes it a core research infrastructure for applications in quantum devices (quantum dots, single-photon detectors), MEMS/NEMS, nanophotonics, plasmonics, metamaterials, biosensors, lab-on-a-chip systems, and synthetic biology. By combining advanced technical performance with multidisciplinary compatibility, the Elionix ELS-G100 provides researchers with a powerful platform for cutting-edge nanoelectronics, quantum technology development, optical communication components, and collaborative research in nanoscience and nanotechnology.
Center for Nanoscience and Nanotechnology | Site
Edmond J. Safra (Givat-Ram)
Nano Center
Contacts
- Golan Tanami
- golant@savion.huji.ac.il